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Inside an IBM Quantum Chip
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Nano-Characterization and Nano-Fabrication Using Electron Beam and Ion Beam Tools - Lecture 13
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- 1 Nano-Characterization and Nano-Fabrication using EB/IB tools
- 2 Table of Contents
- 3 Introduction to "Nano-World"
- 4 Nano/Micro/Macro World
- 5 Brief History of Characterization with Microscopes
- 6 Nano-Characterization
- 7 Nano-Fabrication
- 8 Semiconductor History
- 9 MOSFET Scaling
- 10 Optical Lithography
- 11 Optical Lithography
- 12 DUV and EUV Lithography
- 13 Photon-Based Lithography
- 14 Photon-Based Lithography
- 15 Lithography for Nano-Fabrication
- 16 Lithography for Nano-Fabrication
- 17 Electron Beam Lithography
- 18 Inside an IBM Quantum Chip
- 19 Photons and Electrons
- 20 Electron Beam Lithography
- 21 EBL Process
- 22 EBL Post Processing Pattern Transfer
- 23 COP/PMMA DL Lift-Off Process
- 24 Resolution Pattern
- 25 Resolution Test Results
- 26 Resolution Test Results: Lift-Off
- 27 EBL Post Processing Pattern Transfer
- 28 Zep REI Etch Process
- 29 Resolution Test Results: RIE Etch
- 30 EBL in Research Environment
- 31 EBL in Research Environment
- 32 Nano-Fabrication in Research Environment
- 33 Lithography for Nano-Fabrication
- 34 FIB/SEM
- 35 Electrons and Ga+ Ions
- 36 In-Solid Interaction
- 37 What can IB Do?
- 38 Examples: Fabrication of Plasmonic Antennas
- 39 EBL and IBL
- 40 EBL and IBL
- 41 Example 1: AFM Probe Modification
- 42 Example 2: Metal Tip Modification
- 43 Example 3: Cutting out a Slab with a Specific Crystallographic Orientation
- 44 FIB FIB-FESEM
- 45 FIB as Characterization Tool
- 46 Demo
