Class Central is learner-supported. When you buy through links on our site, we may earn an affiliate commission.

YouTube

Plasma Technology: An Enabling Tool for Modern Manufacturing - NACK Nano-Educators Seminar

nanohubtechtalks via YouTube

Overview

Explore plasma technology as an enabling tool for modern manufacturing in this comprehensive 1-hour 24-minute seminar. Delve into the importance of nanotechnology and nanofabrication, focusing on selective material removal processes in semiconductor manufacturing. Compare wet etching methods with plasma etching, examining isotropic and anisotropic etch profiles. Gain insights into plasma technology, including gas plasma ionization and reactive ion etching. Learn about etch system components and the "wine glass" etch profile. Discover how plasma technology is revolutionizing manufacturing processes and shaping the future of nanotechnology.

Syllabus

Plasma Technology, an enabling tool for modern manufacturing
Today's Outline
Why nanotechnology is important What is Nanofabrication?
Why nanotechnology is important
Today's Outline
Plasma technology, describing the tool
Etch technology, describing the tool
Etch technology, describing the tool
Isotropic Vs Anisotropic
Anisotropic Vs Isotropic
Etch Profiles
Wet Etch isotropic
Bonus Poll, The Beatles
Today's Outline
Plasma technology, describing the tool Plasma Overview
Plasma technology, describing the tool Plasma Overview
Plasma technology, describing the tool Plasma Overview
Plasma technology, describing the tool Gas plasmas are a function of ionization
Plasma technology, describing the tool
A Plasm Etch System
Reactive Ion Etch
The "Wine Glass" Etch Profile
Today's Outline
Summary life changing

Taught by

nanohubtechtalks

Reviews

Start your review of Plasma Technology: An Enabling Tool for Modern Manufacturing - NACK Nano-Educators Seminar

Never Stop Learning.

Get personalized course recommendations, track subjects and courses with reminders, and more.

Someone learning on their laptop while sitting on the floor.